000 -LEADER |
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04055nam a22004215i 4500 |
003 - CONTROL NUMBER IDENTIFIER |
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OSt |
005 - DATE AND TIME OF LATEST TRANSACTION |
control field |
20140310153327.0 |
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION |
fixed length control field |
cr nn 008mamaa |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION |
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121213s2013 au | s |||| 0|eng d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
9783211993569 |
|
978-3-211-99356-9 |
050 #4 - LIBRARY OF CONGRESS CALL NUMBER |
Classification number |
TA418.7-418.76 |
|
Classification number |
TA418.9.T45 |
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER |
Classification number |
620.44 |
Edition number |
23 |
264 #1 - |
-- |
Vienna : |
-- |
Springer Vienna : |
-- |
Imprint: Springer, |
-- |
2013. |
912 ## - |
-- |
ZDB-2-CMS |
100 1# - MAIN ENTRY--PERSONAL NAME |
Personal name |
Schmidt, Bernd. |
Relator term |
author. |
245 10 - IMMEDIATE SOURCE OF ACQUISITION NOTE |
Title |
Ion Beams in Materials Processing and Analysis |
Medium |
[electronic resource] / |
Statement of responsibility, etc |
by Bernd Schmidt, Klaus Wetzig. |
300 ## - PHYSICAL DESCRIPTION |
Extent |
IX, 418 p. 96 illus., 65 illus. in color. |
Other physical details |
online resource. |
505 0# - FORMATTED CONTENTS NOTE |
Formatted contents note |
Preface -- 1. Introduction -- 2. Ion- Solid Interactions -- 2.1 Fundamental Principles -- 2.2 Binary Elastic Collisions -- 2.3 Ion Stopping -- 2.4 Ion Channeling -- 2.5 Ion Induced Target Modifications -- 3. Ion Beam Technology -- 3.1 Principles of Ion Accelerators -- 3.2 Ion Sources -- 3.3 Ion Acceleration -- 3.4 Ion Beam Handling -- 3.5 Ion Implantation Systems -- 3.6 Electrostatic Ion Accelerator Systems -- 3.7 Focused Ion Beam Systems -- 4. Materials Processing -- 4.1 Ion Irradiation Effects in Crystalline Materials -- 4.2 Ion Implantation into Semiconductors -- 4.3 Ion Beam Synthesis of New Phases in Solids -- 4.4 Ion Beam Mixing of Interfaces -- 4.5 Ion Beam Slicing of Thin Layers (Smart-Cut for SOI and Solar Cells) -- 4.6 Ion Beam Erosion, Sputtering and Surface Patterning (Ripples and Dots) -- 4.7 Ion Beam Shaping of Nanomaterials -- 4.8 Ion Beam Processing of other Materials -- 5. Ion Beam Preparation of Materials -- 5.1 Removal of Target Atoms by Sputtering -- 5.2 Effects on Sputtering Yield -- 5.3 Preparation Steps by Ion Beam Irradiation -- 5.4 Focus Ion Beam (FIB) Preparation -- 6. Ion Beam Analysis by Ion Beams -- 6.1 Introduction -- 6.2 Ion Beam Analytical Techniques – a Survey -- 6.3 Ion Beam Scattering Techniques -- 6.4 Ion Beam Induced Photon Emission -- 6.5 Nuclear Reaction Analysis (NRA) -- 6.6 Ion Beam Induced Electron and Light Emission -- 6.7 Secondary Ion Emission -- 6.8 Ion Beam Imaging Techniques -- 7. Special Ion Beam Applications in Materials Analysis Problems -- 7.1 Functional Thin Films and Layers -- 7.2 Ion Beam Analysis in Art and Archeometry -- 7.3 Special Applications in Life Sciences -- Index. |
520 ## - SUMMARY, ETC. |
Summary, etc |
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text. |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name as entry element |
Surfaces (Physics). |
|
Topical term or geographic name as entry element |
Materials Science. |
|
Topical term or geographic name as entry element |
Surfaces and Interfaces, Thin Films. |
|
Topical term or geographic name as entry element |
Atomic, Molecular, Optical and Plasma Physics. |
|
Topical term or geographic name as entry element |
Surface and Interface Science, Thin Films. |
700 1# - ADDED ENTRY--PERSONAL NAME |
Personal name |
Wetzig, Klaus. |
Relator term |
author. |
710 2# - ADDED ENTRY--CORPORATE NAME |
Corporate name or jurisdiction name as entry element |
SpringerLink (Online service) |
773 0# - HOST ITEM ENTRY |
Title |
Springer eBooks |
776 08 - ADDITIONAL PHYSICAL FORM ENTRY |
Display text |
Printed edition: |
International Standard Book Number |
9783211993552 |
856 40 - ELECTRONIC LOCATION AND ACCESS |
Uniform Resource Identifier |
http://dx.doi.org/10.1007/978-3-211-99356-9 |
942 ## - ADDED ENTRY ELEMENTS (KOHA) |
Source of classification or shelving scheme |
|
Item type |
E-Book |