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Ion Beams in Nanoscience and Technology (Record no. 27637)

000 -LEADER
fixed length control field 04541nam a22004935i 4500
003 - CONTROL NUMBER IDENTIFIER
control field OSt
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20140310153328.0
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr nn 008mamaa
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 100301s2010 gw | s |||| 0|eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9783642006234
978-3-642-00623-4
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number T174.7
Classification number TA418.9.N35
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 620.115
Edition number 23
264 #1 -
-- Berlin, Heidelberg :
-- Springer Berlin Heidelberg,
-- 2010.
912 ## -
-- ZDB-2-CMS
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Hellborg, Ragnar.
Relator term editor.
245 10 - IMMEDIATE SOURCE OF ACQUISITION NOTE
Title Ion Beams in Nanoscience and Technology
Medium [electronic resource] /
Statement of responsibility, etc edited by Ragnar Hellborg, Harry J. Whitlow, Yanwen Zhang.
300 ## - PHYSICAL DESCRIPTION
Extent xxiii, 457 p
Other physical details online resource.
440 1# - SERIES STATEMENT/ADDED ENTRY--TITLE
Title Particle Acceleration and Detection,
International Standard Serial Number 1611-1052
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note Trends in nanoscience and technology -- Nanoscale Engineering in the Biosciences -- High Speed Electronics -- Surface Modification Using Reactive Landing of Mass-Selected Ions -- Basic ion-matter interactions in nanometre scale materials -- Basics of Ion Scattering in Nanoscale Materials -- Box 1: Stopping of Ions in Nanomaterials -- Box 2: Sputtering -- Box 3: Ion Ranges -- Computer Simulation Methods for Defect Configurations and Nanoscale Structures -- Characterising Nanoscale Crystal Perfection by Crystal Mapping -- Box 4: Interatomic Potential -- Ion beam characterisation of nanoscale materials -- Medium Energy Ion Scattering for Near Surface Structure and Depth Profiling -- Box 5: Surface Crystallography Terminology -- Thin Film Characterisation Using MeV Ion Beams -- Nanoscale Materials Defect Characterisation -- Box 6: Nanoscale Defects -- Box 7: Diagnostic Ion Beam Luminescence -- Nanomaterials Science with Radioactive Ion Beams -- Nanoscale materials processing with ion beams -- Nanocluster and Nanovoid Formation by Ion Implantation -- Plasma Etching and Integration with Nanoprocessing -- Focused Ion Beam Machining and Deposition -- Box 8: Sample Preparation for Transmission Electron Microscopy Using a Focused Ion Beam -- Box 9: Integrated Circuit Chip Modification Using Focused Ion Beams -- Proton Beam Writing: A New 3D Nanolithographic Technique -- Box 10: Proton Beam Writing of Optical Structures -- Box 11: Tissue Engineering and Bioscience Methods Using Proton Beam Writing -- Box 12: Stamps for Nanoimprint Lithography -- Box 13: Silicon Micro/Nano-Fabrication Using Proton Beam Writing and Electrochemical Etching -- Nanoscale Materials Modification for Device Applications -- Luminescence, Ion Implantation, and Nanoparticles -- Micro- and Nanoengineering with Ion Tracks -- Equipment and practice -- Ion Accelerators for Nanoscience -- Focusing keV and MeV Ion Beams -- Ion Spectrometers and Detectors -- Electronics for Application of Ion Beams in Nanoscience.
520 ## - SUMMARY, ETC.
Summary, etc Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implanation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Materials.
Topical term or geographic name as entry element Particle acceleration.
Topical term or geographic name as entry element Nanotechnology.
Topical term or geographic name as entry element Material Science.
Topical term or geographic name as entry element Nanotechnology.
Topical term or geographic name as entry element Measurement Science and Instrumentation.
Topical term or geographic name as entry element Particle Acceleration and Detection, Beam Physics.
Topical term or geographic name as entry element Solid State Physics.
Topical term or geographic name as entry element Spectroscopy and Microscopy.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Whitlow, Harry J.
Relator term editor.
Personal name Zhang, Yanwen.
Relator term editor.
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SpringerLink (Online service)
773 0# - HOST ITEM ENTRY
Title Springer eBooks
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Printed edition:
International Standard Book Number 9783642006227
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://dx.doi.org/10.1007/978-3-642-00623-4
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Source of classification or shelving scheme
Item type E-Book
Copies
Price effective from Permanent location Date last seen Not for loan Date acquired Source of classification or shelving scheme Koha item type Damaged status Lost status Withdrawn status Current location Full call number
2014-04-14AUM Main Library2014-04-14 2014-04-14 E-Book   AUM Main Library620.115
Languages: 
English |
العربية