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Electromigration Modeling at Circuit Layout Level (Record no. 12756)

000 -LEADER
fixed length control field 02426nam a22004215i 4500
003 - CONTROL NUMBER IDENTIFIER
control field OSt
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20140310143401.0
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr nn 008mamaa
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 130321s2013 si | s |||| 0|eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9789814451215
978-981-4451-21-5
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 658.56
Edition number 23
264 #1 -
-- Singapore :
-- Springer Singapore :
-- Imprint: Springer,
-- 2013.
912 ## -
-- ZDB-2-ENG
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Tan, Cher Ming.
Relator term author.
245 10 - IMMEDIATE SOURCE OF ACQUISITION NOTE
Title Electromigration Modeling at Circuit Layout Level
Medium [electronic resource] /
Statement of responsibility, etc by Cher Ming Tan, Feifei He.
300 ## - PHYSICAL DESCRIPTION
Extent IX, 103 p. 75 illus., 2 illus. in color.
Other physical details online resource.
440 1# - SERIES STATEMENT/ADDED ENTRY--TITLE
Title SpringerBriefs in Applied Sciences and Technology,
International Standard Serial Number 2191-530X
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note Introduction -- 3D Circuit Model Construction and Simulation -- Comparison of EM Performance in Circuit Structure and Test Structure -- Interconnect EM Reliability Modeling at Circuit Layout Level -- Conclusion.
520 ## - SUMMARY, ETC.
Summary, etc Integrated circuit (IC) reliability is of increasing concern in present-day IC technology where the interconnect failures significantly increases the failure rate for ICs with decreasing interconnect dimension and increasing number of interconnect levels.  Electromigration (EM) of interconnects has now become the dominant failure mechanism that determines the circuit reliability. This brief addresses the readers to the necessity of 3D real circuit modelling in order to evaluate the EM of interconnect system in ICs, and how they can create such models for their own applications. A 3-dimensional (3D) electro-thermo-structural model as opposed to the conventional current density based 2-dimensional (2D) models is presented at circuit-layout level. 
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
Topical term or geographic name as entry element System safety.
Topical term or geographic name as entry element Engineering.
Topical term or geographic name as entry element Quality Control, Reliability, Safety and Risk.
Topical term or geographic name as entry element Electronic Circuits and Devices.
Topical term or geographic name as entry element Atomic, Molecular, Optical and Plasma Physics.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name He, Feifei.
Relator term author.
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SpringerLink (Online service)
773 0# - HOST ITEM ENTRY
Title Springer eBooks
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Printed edition:
International Standard Book Number 9789814451208
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://dx.doi.org/10.1007/978-981-4451-21-5
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Source of classification or shelving scheme
Item type E-Book
Copies
Price effective from Permanent location Date last seen Not for loan Date acquired Source of classification or shelving scheme Koha item type Damaged status Lost status Withdrawn status Current location Full call number
2014-04-03AUM Main Library2014-04-03 2014-04-03 E-Book   AUM Main Library658.56

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