000 -LEADER |
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02426nam a22004215i 4500 |
003 - CONTROL NUMBER IDENTIFIER |
control field |
OSt |
005 - DATE AND TIME OF LATEST TRANSACTION |
control field |
20140310143401.0 |
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION |
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cr nn 008mamaa |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION |
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130321s2013 si | s |||| 0|eng d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
9789814451215 |
|
978-981-4451-21-5 |
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER |
Classification number |
658.56 |
Edition number |
23 |
264 #1 - |
-- |
Singapore : |
-- |
Springer Singapore : |
-- |
Imprint: Springer, |
-- |
2013. |
912 ## - |
-- |
ZDB-2-ENG |
100 1# - MAIN ENTRY--PERSONAL NAME |
Personal name |
Tan, Cher Ming. |
Relator term |
author. |
245 10 - IMMEDIATE SOURCE OF ACQUISITION NOTE |
Title |
Electromigration Modeling at Circuit Layout Level |
Medium |
[electronic resource] / |
Statement of responsibility, etc |
by Cher Ming Tan, Feifei He. |
300 ## - PHYSICAL DESCRIPTION |
Extent |
IX, 103 p. 75 illus., 2 illus. in color. |
Other physical details |
online resource. |
440 1# - SERIES STATEMENT/ADDED ENTRY--TITLE |
Title |
SpringerBriefs in Applied Sciences and Technology, |
International Standard Serial Number |
2191-530X |
505 0# - FORMATTED CONTENTS NOTE |
Formatted contents note |
Introduction -- 3D Circuit Model Construction and Simulation -- Comparison of EM Performance in Circuit Structure and Test Structure -- Interconnect EM Reliability Modeling at Circuit Layout Level -- Conclusion. |
520 ## - SUMMARY, ETC. |
Summary, etc |
Integrated circuit (IC) reliability is of increasing concern in present-day IC technology where the interconnect failures significantly increases the failure rate for ICs with decreasing interconnect dimension and increasing number of interconnect levels. Electromigration (EM) of interconnects has now become the dominant failure mechanism that determines the circuit reliability. This brief addresses the readers to the necessity of 3D real circuit modelling in order to evaluate the EM of interconnect system in ICs, and how they can create such models for their own applications. A 3-dimensional (3D) electro-thermo-structural model as opposed to the conventional current density based 2-dimensional (2D) models is presented at circuit-layout level. |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name as entry element |
Engineering. |
|
Topical term or geographic name as entry element |
System safety. |
|
Topical term or geographic name as entry element |
Engineering. |
|
Topical term or geographic name as entry element |
Quality Control, Reliability, Safety and Risk. |
|
Topical term or geographic name as entry element |
Electronic Circuits and Devices. |
|
Topical term or geographic name as entry element |
Atomic, Molecular, Optical and Plasma Physics. |
700 1# - ADDED ENTRY--PERSONAL NAME |
Personal name |
He, Feifei. |
Relator term |
author. |
710 2# - ADDED ENTRY--CORPORATE NAME |
Corporate name or jurisdiction name as entry element |
SpringerLink (Online service) |
773 0# - HOST ITEM ENTRY |
Title |
Springer eBooks |
776 08 - ADDITIONAL PHYSICAL FORM ENTRY |
Display text |
Printed edition: |
International Standard Book Number |
9789814451208 |
856 40 - ELECTRONIC LOCATION AND ACCESS |
Uniform Resource Identifier |
http://dx.doi.org/10.1007/978-981-4451-21-5 |
942 ## - ADDED ENTRY ELEMENTS (KOHA) |
Source of classification or shelving scheme |
|
Item type |
E-Book |