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Nanoimprint Lithography: An Enabling Process for Nanofabrication

by Zhou, Weimin.
Authors: SpringerLink (Online service) Physical details: XIII, 249 p. 225 illus., 107 illus. in color. online resource. ISBN: 3642344283 Subject(s): Engineering. | Nanochemistry. | Optical materials. | Nanotechnology. | Engineering. | Nanotechnology and Microengineering. | Optical and Electronic Materials. | Nanotechnology. | Nanochemistry.
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E-Book E-Book AUM Main Library 620.5 (Browse Shelf) Not for loan

Principles and statues of nanoimprint lithography -- Stamp Fabrication -- stamp surface treatment -- Nanoimprint lithography resists -- Nanoimprint lithography process -- Modeling and Simulation of NIL -- Application of NIL in Light emitting Diodes -- Application of NIL in memory devices -- Application of NIL in solar cell.

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

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