Library of American University of Madaba
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Photomask fabrication technology /
by Eynon, Benjamin G.
Authors: Wu, Banqiu.%author Series: McGraw-Hill electronic engineering Published by : McGraw-Hill, (New York :) Physical details: xi, 571 p. : ill. ; 24 cm. ISBN: 0071445633 Subject(s): Integrated circuits %Masks. | Masks (Electronics) | Microlithography. Year: 2005Online Resources:
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| Item type | Location | Call Number | Status | Date Due |
|---|---|---|---|---|
 Book |
AUM Main Library | 621.381531 E979 (Browse Shelf) | Available |
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| 621.3815284 M275Strained-Si heterostructure field effect devices / | 621.38153 B35Semiconductors : | 621.38153 B35Semiconductors : | 621.381531 E979Photomask fabrication technology / | 621.381531 T562Time-triggered communication / | 621.381531 T562Time-triggered communication / |
Includes bibliographical references and index.
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